ZHN/SEM nanoindenter for scanning electron microscopes

Applications

Hardness testing to ISO 14577
Dynamic tests

Test load

0 - 0.2 N

Applications

Research & development (in an SEM)

Small but mighty

The ZHN/SEM nanoindenter for installation in a scanning electron microscope (SEM) enables micromechanical experiments to be performed while observing the specimen at maximum resolution. It possesses the largest measuring range currently available, with a maximum displacement measurement of 200 µm and a maximum force of 200 mN, combined with very low-noise force and displacement sensors in a low-vibration environment. Instrument stiffness is so high that conventional hardness measurements can be performed without difficulty.

The standard system was developed for installation on the stage system of various SEMs, but can also be mounted on the chamber wall. The existing tilt and positioning options of the SEM stage can be used with this system.

The system consists of:

the measuring head with sensors and actuator
a piezo stage system for positioning specimens in the XY direction and optional rotation around the indenter axis
a stiff mechanical Z-stage for displacement of the measuring head towards the specimen
PC and controller
easy-to-use, highly flexible software
one or two flanges with feed-throughs (SEM-specific)

Advantages and features

Indenter can be tailored to customer requirements over a wide range.
Force and displacement control available as closed or open loop.
Dynamic measurement method with frequencies up to 100 Hz for fatigue and continuous stiffness measurements available as option.
An outstanding feature of the measuring head is that it can be used in the compression and tensile directions over the entire measuring range.
Video synchronization: the recorded image can be shown by transferring data to an additional window on the SEM computer via TCP/IP.

Technical overview

Description	Value
Item No.	1020054
Type	ZHN/SEM
Test load, max. (Fmax)	approx. 200	mN¹
Displacement, max.	approx. 200 µm at 20 mN; 1500 µm at 200 mN
Force resolution, digital	≤0.02	μN
Displacement resolution, digital	≤0.001	nm
Noise level, force measurement (RMS)	≤0.5	μN
Noise level, displacement measurement (RMS)	≤0.5	nm
Stage system
X and Y-stage: movement range (standard)	21 x12	mm
X and Y-stage: positioning accuracy	≤50	nm
X and Y-stage: measurement system resolution	1	nm
Z-stage: movement range	15 (optionally 25)	mm
Z-stage: positioning accuracy	≤0.1	μm
Z-stage: measurement system resolution	50	nm

Compression and tensile

Do you have any questions regarding our products?

Please feel free to contact our product experts.
We look forward to discussing your needs.

Typical applications for ZHN/SEM

Attachment of the nanoindenter to a scanning electron microscope

Production of appropriate adapters and adjustment options plus electrical feed-throughs is entirely in accordance with your specification.

Compression test on copper monocrystall

SEM images of [1 0 0] copper columns with a cross-section of 2 x 2 µm, recorded in situ after (a) 3.3 % compression (b) 13.4 % compression (c) 23.4 % compression(d) unloaded specimen with crystal orientation marked on and active cleavage planes. © Dr C. Motz, Saarland University, Germany

Fracture toughness experiments on tungsten

Bending beams were loaded in situ with a cube corner indenter. The loading and unloading rate for all specimens was 1 mm/min. Stable crack growth was observed in all specimens. © Dr Wurster, ESI, Leoben, Austria

Determining crystal size-dependent plasticity

SEM images of a specimen during an in-situ tensile test (a-e) and after unloading (f). The corresponding positions within the stress-strain curve are marked on the graphic. A second loading and unloading stage is indicated by arrows. © Dr Kiener, ESI, Leoben, Austria